Multilayer deposition on large-area, figured X-ray optics

David L. Windt

Bell Laboratories
Room 1D-456, 600 Mountain Ave, Murray Hill, NJ 07974
windt@physics.att.com

I describe a multilayer deposition system that has been developed for coating
large-area, figured X-ray optics, as required for extreme-ultraviolet
lithography, for example. In this system, multilayers are deposited by DC
magnetron sputtering, and coating uniformity on figured optics is adjusted by 
implementing contoured, shaped baffles during deposition.  I also describe an
EUV reflectometer  which is capable of measuring the reflectance versus
wavelength across the surface of these optics, so that the coating uniformity
can be determined with the required precision.  Finally, I present some recent
results wherein these facilities and techniques have been used to deposit
high-reflectance Mo/Si multilayer coatings onto a variety of spherical and
aspherical substrates.