Multilayer thin film structures optimized for their X-ray optical properties have enabled the construction of a variety of new optical elements and instruments operating in the EUV, soft X-ray and hard X-ray spectral regions. This technology is by now used for a wide range of scientific and industrial applications, including photolithography, astronomy and solar physics, plasma physics, synchrotron radiation, X-ray and free-electron lasers, ultrashort-pulse physics, X-ray crystallography, and others. Continued advancement in these areas depends on further improvements in multilayer technology, which in turn requires a deeper understanding of the X-ray optical physics and material science of these nanometer-scale heterostructures.

The 9th International Conference on the Physics of X-Ray Multilayer Structures continues our tradition of holding this biyearly meeting in a relatively isolated winter resort environment, this year in Big Sky, Montana. The PXRMS meetings are limited in size, and the locations are chosen specifically to provide attendees the opportunity to present recent results in an informal, relaxed and intimate setting, with plenty of free time, in order to promote discussion and the free exchange of new ideas. Our hope is that these interactions, supplemented by invited talks on especially novel, innovative or comprehensive research, will lead to new ideas and opportunities for research and collaboration.

Contributed papers are solicited on any topic relating to X-ray multilayers that falls within the general scope of the PXRMS'08 conference, including film growth, interface formation, microstructure development, X-ray performance, thin film characterization techniques, etc., as well as new applications of planar, free standing, and figured multilayer X-ray optics.